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CMPChemical Mechanical Polishing
The planarization step that lets every layer start from a perfect surface.
The step
Process Overview
CMP holds planarity through multilevel interconnect. We represent EBARA and ACCRETECH CMP polishers from Japan, with sales and service.
Partners
Represented Brands
Official Japanese OEM channels, with sales and service under one roof.
EBARA
CMP polishing systems
ACCRETECH
CMP polishing systems
Reference data
Equipment Specifications
A snapshot of the main tool categories per brand; full specifications come with the quote.
| Tool category | Applicable nodes | Key specifications |
|---|---|---|
| EBARACMP polishing systems | Multilevel interconnect planarization | Removal rate and polish uniformity by tool configuration |
| ACCRETECHCMP polishing systems | Multilevel interconnect planarization | Removal rate and polish uniformity by tool configuration |
Under the hood
AI Integration
Benchmark models published between 2024 and 2026, deployed together with the tool.
MaxViT / U-Net
Static IR drop: MaxViT encoder with U-Net/FPN decoder (SPICE converted to images)
MAE<15×10⁻⁵V, 10–30× faster than NGSPICE
ICCAD'23 winning flow
ConvNeXtV2-Nano + UPerNet electrical-simulation surrogate for planarity correlation
MAE 0.075mV, F1 0.56
End to end
Service Flow
One point of contact from purchase order to acceptance.
- 1Procurement
- 2De-install
- 3Shipping
- 4Installation
- 5Acceptance
Request the tool list and a quote
We provide new and used tool evaluation, specification confirmation and rigging quotes for CMP equipment. Email us to get started.